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Phase Masks for femtosecond application

등록일 2006.07.19 16:44
1.  Phase masks for femtosecond applications

Ibsen Phase masks have always been used extensively for
high power excimer laser illumination (typically 248 and
193 nm); only the highest grade UV fused silica quality
has been utilized. Material screening at 248 nm and 193 nm
is performed to ensure non-fluorescence at these
wavelengths.

Recently, researchers have begun working with producing
gratings in fibers or in/on waveguides of various materials
using femtosecond lasers of numerous wavelengths.

For Ibsen, this development is seen as taking advantage
partly of Ibsen's Phase mask know-how and partly of Ibsen's
femtosecond laser pulse compression grating know-how. Both
these grating types are based on Ibsen's fused silica
transmission grating technology. Versatile etching
capabilities combined with diffraction efficiency
measurement capabilities over 193-2200 nm wavelengths is
part of the capability base.

Ibsen collects data on high power uses of our gratings,
for more information see:

http://www.transmission-gratings.com/highpower/

------

2.  Do you have surplus fiber optic test equipment?

Ibsen is looking to buy the following test equipment,
contact us if you have such surplus test equipment
sitting around collecting dust:

- Tunable laser. 1500-1620 nm / 1520-1580 nm.

- Polarization controller/synthesizer/stabilizer.

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